Physical electronics devices and ics miscellaneous
- A silicon crystal having a cross-sectional area of 0.001 cm2 and a length of 20 µm is connected to its ends to a 20 V battery. At T = 300 K, we want a current of 100 mA in crystal. The concentration of donor atoms to be added is—
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R = V = 20V = 20 = 200 Ω and from relation I 100mA 100 × 10–3 R = ρl = 1 · 1 A σ A or σ = I = 2 × 10–3 RA 200 × 0.001
= 0.01 (Ω-cm)–1
and σ = n0 q. µn for Si, µn = 1350
0.01 = n0. (1.6 × 10–19). 1350n0 = 0.01 1.6 × 10–19 × 1350
= 4.6 × 1013 cm–3
since n0 >> ni (intrinsic concentration)
it means n0 = Nd
Hence alternative (B) is the correct choice.Correct Option: B
R = V = 20V = 20 = 200 Ω and from relation I 100mA 100 × 10–3 R = ρl = 1 · 1 A σ A or σ = I = 2 × 10–3 RA 200 × 0.001
= 0.01 (Ω-cm)–1
and σ = n0 q. µn for Si, µn = 1350
0.01 = n0. (1.6 × 10–19). 1350n0 = 0.01 1.6 × 10–19 × 1350
= 4.6 × 1013 cm–3
since n0 >> ni (intrinsic concentration)
it means n0 = Nd
Hence alternative (B) is the correct choice.
- A silicon semiconductor sample at T = 300 K is doped with phosphorus atoms at a concentrations of 1015 cm– 3. The position of the Fermi level with respect to the intrinsic Fermi level is—
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We know that,
EF – EFi = kT In Nd Ni = 26 meV In 1015 1.5 × 1010 = 26 × 10–3 1015 eV 1.5 × 1010
= 0.287 eV
≅ 0.3 eV
Hence alternative (A) is the correct choice.
Correct Option: A
We know that,
EF – EFi = kT In Nd Ni = 26 meV In 1015 1.5 × 1010 = 26 × 10–3 1015 eV 1.5 × 1010
= 0.287 eV
≅ 0.3 eV
Hence alternative (A) is the correct choice.
- A silicon sample contains acceptor atoms at a concentration of Na = 5 × 1015 cm–3. Donor atoms are added forming and n-type compensated semiconductor such that the Fermi level is 0.215 eV below the conduction band edge. The concentration of donors atoms added are—
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We know that, n0 = Nd – Na = Nc e – {( EC – EF) / kT}
for Si, Nc = 2.8 × 1019 cm–3
given Na = 5 × 1015 cm–3
Now, Nd = Na + Nc e – {( EC – EF) / kT}
or Nd = 5 × 1015 + 2.8 × 1019 e – (215eV / 26 x 10-3eV)
{˙.˙ given that Fermi level is 0.215 eV below the or Nd = 1.19 × 1016 cm–3 conduction band i.e. Ec – EF = 0.215 eV}
Hence alternative (A) is the correct choice.Correct Option: A
We know that, n0 = Nd – Na = Nc e – {( EC – EF) / kT}
for Si, Nc = 2.8 × 1019 cm–3
given Na = 5 × 1015 cm–3
Now, Nd = Na + Nc e – {( EC – EF) / kT}
or Nd = 5 × 1015 + 2.8 × 1019 e – (215eV / 26 x 10-3eV)
{˙.˙ given that Fermi level is 0.215 eV below the or Nd = 1.19 × 1016 cm–3 conduction band i.e. Ec – EF = 0.215 eV}
Hence alternative (A) is the correct choice.
- A sample of silicon at T = 300 K is doped with boron at a concentration of 2.5 × 103 cm–3 and with arsenic at a concentration of 1 × 103 cm–3. The material is—
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Since Na > Nd → It means material is p-type
Po = Na – Nd
or Po = (2.5 × 103 – 1.0 × 103) cm–3
or Po = 1.5 × 103 cm–3Correct Option: A
Since Na > Nd → It means material is p-type
Po = Na – Nd
or Po = (2.5 × 103 – 1.0 × 103) cm–3
or Po = 1.5 × 103 cm–3
- In a bipolar transistor at room temperature, if the emitter current is doubled the voltage across its base-emitter junction—
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NA
Correct Option: C
NA